小圆柱式微波等离子体沉积（CVD）系统（Small cylinder microwave plasma deposition (CVD) system）

该设备为微波等离子化学气相沉积系统（MWCVD）。采用2.45GHz频率微波源，电场激发谐振腔模式为TM013模式，激发稳定的等离子体。该系统可以稳定生长金刚石单晶材料、多晶晶圆。通过工艺调节,可以稳定生长出 2 英寸金刚石晶圆。

The device is a microwave plasma chemical vapor deposition system (MWCVD). A microwave source with a frequency of 2.45GHz is used, and the mode of the resonator excited by the electric field is TM013 mode to excite the stable plasma. The system can grow diamond monocrystalline materials and polycrystalline wafers stably. Through process adjustment, 2-inch adamantine wafers can be grown stably.

主要应用领域：半导体衬底、热沉片、珠宝、刀具、机械密封、新一代移动通信、智能电网、消费类电子等。

Main application areas: semiconductor substrate, heat sink, jewelry, cutting tools, mechanical seals, new generation mobile communication, smart grid, consumer electronics, etc.