第二代碳化硅晶片腐蚀清洗设备（Second generation silicon carbide wafer corrosion cleaning equipment）

设备采用四工位设计，全封闭工作台和强排风系统有效防止腐蚀性碱蒸汽对操作人员的身体伤害。该系统集SiC晶片热强碱腐蚀、快速清洗，再次超声清洗和晶片烘干为一体，充分避免了操作人员与腐蚀性强碱溶剂的接触。整个工艺流程全部自动化控制，操作人员只需完成取放片操作，腐蚀效率高，适合产业化应用。

The equipment adopts four-station design. fully enclosed workbench and strong exhaust system to effectively prevent corrosive alkali steam to the operator's body injury. The system integrates SiC wafer hot alkali corrosion, rapid cleaning, ultrasonic cleaning and wafer drying, fully avoiding the operator's contact with corrosive alkali solvents. The whole process is automatically controlled, and the operator only needs to complete the operation of taking and placing pieces, which has high corrosion efficiency and is suitable for industrial application.