单腔立式外延炉（Single chamber vertical epitaxial furnace）

相较现有立式外延炉有更低的硬件成本,更小的占地面积;

    Compared with existing vertical epitaxial furnaces, the hardware cost is lower and the footprint is smaller;

兼容4/6/8寸晶圆外延生长,成膜质量好,可实现厚外延层快速生长；

    compatible with 4/6/8 inch wafer epitaxial growth, good film quality, can achieve thick epitaxial layer rapid growth;

更长的维护周期,更低的耗材成本；

     longer maintenance cycle, lower consumable cost;