水平双腔外延炉（Horizontal double cavity epitaxial furnace）

水平双腔布置,硬件成本低于两台单腔外延炉;

    Horizontal double cavity arrangement, the hardware cost is lower than two single cavity epitaxial furnace;

双腔工艺和维护独立,实现不停机连续生产；

    Dual cavity process and maintenance independent, to achieve continuous production without shutdown;

兼容4/6寸晶圆外延生长,外延层质量优异;

     Compatible with 4/6 inch wafer epitaxial growth, excellent epitaxial layer quality;

全自动上下料，释放人工成本;

     Automatic loading and unloading, release labor cost;